Resonac Specialty Gas Taiwan Co., Ltd.
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Applicable to the etching and thin film process in semiconductor, TFT-LCD, PV and LED
C4F6, CF4, CHF3, CH2F2, C2F6, C3F8, C4F8, C2HF5, CH3F, C3F6, SF6, BCl3, Cl2, HBr, HCl, SO2, CH4, etc.
NF3, C3F8, SF6, C2F6, 20%F2/N2, CO2, HCl, HF(5N), etc.
NH3, N2O, SiF4, 1%PH3/H2, H2Se, SiH4, Si2H6, etc.
※N2O[Temporary license for selling : S001-01-00033, S001-01-00154. Purchase license authorized by EPA chemical bureau is required.]
Applicable to the rinse process for wafer and glass panel
Solfine-Cleaner series: SC9500, SR6090, etc.
Solfine-TM, Solfine-WZ
Solfine-SK
Others
Solfine-MP
High purity NMP, Solfine PX7, S-715D, etc.
Lens Cleaner
Applicable to the treatment of waste gases produced by manufacturing process